plasma_cleaner_pdf-32g-2
Table of Contents
Plasma Cleaner manual
DO's and DONT's
Only use bare substrate in the plasma cleaner, all exceptions should be discussed.
- Si
- SiO2
- glass/quartz
MANUAL
- Load samples on the sample tray
- Start the vacuum pump while holding the door, make sure black valve is pointing down
- Pump down to <100mTorr
- Set black valve to the needle valve
- if needle valve is open the pressure should go to previous setpoint (check the logbook)
- or change the setpoint
- Wait for pressure to stabilize
- set RF (low, mid or high)
- When plasma ignites start your timer
- Turn off RF when timer finishes
- Close black valve (valve pointing down)
- Pump down to <100mTorr to make sure etch products are removed from the chamber
- Stop the vacuum pump
- Turn black valve to the right to vent
- vent slowly to avoid samples flying around in the chamber
- Close black valve (valve pointing down)
- close the door
- write in the logbook: name, date, sample, process conditions, any remarks
Recipes
Typical cleaning process:
500-900mTorr
1-3 minutes
High RF
Maintenance
Tip seal change of vacuum pump
Cleaning sample tray and chamber
plasma_cleaner_pdf-32g-2.txt · Last modified: 2023/02/24 07:56 by scholma