NanoLab facilities

Deposition

Electron beam lithography, the Raith 100 / E-line with laser stage is the main workhorse nowadays, it routinely writes 50 nm lines in PMMA, 3 sigma overlay and stitch accuracy are below 80 nm.
Optical lithography is still done

PlasmaLab 90+ RIE etcher (fluorine etcher, SF6, CF4, O2, Ar)
ion beam etcher for dry etching (can do CAIBE)
Nanoscale ion milling is done with the dual beam SEM/FIB at the HREM centre in Delft (400 euro per day)
O₂ barrel etcher for resist removal and substrate cleaning
wetbench in the clean room for development and wet etching
A fume hood for the use of strong acids in 607

FEI NanoSEM 200 scanning electron microscope (BioAFM group) (features a nanotube/wire nanomanipulator, EBID deposition, low vacuum mode, STEM, cryoSEM and many other options)
JEOL 820 SEM scanning electron microscope
RBS analysis at Amolf
120 kV Philips EM410 transmission electron microscope
optical microscopes in the cleanroom and 614
AFM for measuring surface topograpy of films and structures, MFM, EFM etc.
The group has a low angle X-ray diffraction system Siemens D5005 that can measure the crystal structure (if any) and thickness of thin films
Quantum Design MPMS-5S (Magnetic Properties Measurement System) and PPMS (Physical Properties Measurement System)