NanoWiki

about

Anonymous (anonymous@undisclosed.example.com) — 2018-07-19T15:03:17+00:00

About these pages For questions about this website, the equipment, fabrication requests, questions about processing, equipment usage, technical matters etc. you can contact Marcel Hesselberth. The NanoLab is part of the MSM group headed by prof. Jan Aarts.

afm_film_morphology

Anonymous (anonymous@undisclosed.example.com) — 2025-07-29T10:51:46+00:00

Surface Morphology Morphology refers to the shape of an object; in thin films, the surface morphology tells us the shape of the surface. We measure morphology using nanoscale microscopy techniques like STM, AFM and TEM. There is a lot of information in the surface structure. By investigating roughness and grain size, you can optimize thin films for various applications. Material, substrate, deposition technique and parameters all influence the final surface structure. Stay mindful however: th…

afm_room_626_contact_mode

Anonymous (anonymous@undisclosed.example.com) — 2007-07-06T09:50:49+00:00

AFM, room HL 626, contact mode version 1.3, 21 March 2007 1. Switch on the three RHK boxes ( SPM 1000, AIM-DI and VScan) 2. Mount Probe Inspect the cantilevers in the optical microscope. Broken cantilevers should be discarded. Mount a probe into the cantilever holder. Be sure that it is in firm contact with the end of the groove and sitting flat in the base. For contact mode use a silicon nitride probe.

afm_room_626_magnetic_force_microscopy

Anonymous (anonymous@undisclosed.example.com) — 2008-04-21T09:11:22+00:00

Magnetic Force Microscopy General In MFM, a tapping cantilever equipped with a special coated tip is first scanned over the surface of the sample to obtain topographic information. The tip is then raised just above the sample surface. The surface is scanned while being monitored for the influence of magnetic forces. These influences are measured using the principle of force gradient detection. In the absence of magnetic forces, the cantilever has a resonant frequency. This frequency is shif…

afm_room_626_tapping_mode

Anonymous (anonymous@undisclosed.example.com) — 2007-07-04T12:29:52+00:00

AFM room 626 tapping mode (version May 2007) Principle The most commonly used non-contact or partial contact technique, developed to improve the resolution of soft materials, is known as “intermittent contact” (IC) imaging or tapping mode imaging or

afm_veeco_software_manual

Anonymous (anonymous@undisclosed.example.com) — 2007-05-08T12:53:19+00:00

AFM Veeco: Various Manuals Download here manual for Veeco AFMs 7th floor and 6th floor: RHK manuals

atc-1800

Anonymous (anonymous@undisclosed.example.com) — 2025-02-18T15:15:49+00:00

ATC Sputtering System manual [Link to the manual] Description The ATC-1800 sputtering system is feature-rich 4-magnetron system with a large deposition pressure range, 10e-8 mbar range background pressure, substrate heating, substrate RF bias, variable working distance, in-situ gun tilt on all sources, substrate rotation and multi-channel gas blending. The gas inlets are connected to both the chamber and the sources. The system has a loadlock for high throughput and a vacuum chamber that is e…

barrel_etcher

Anonymous (anonymous@undisclosed.example.com) — 2005-04-17T17:05:12+00:00

Description The barrel etcher is an O2 resist etcher/stripper for post-development cleaning of substrates or cleaning of SEM specimen. It is pumped by a 2-stage rotary pump with Fomblin oil. Manual * Open the O2 cylinder * Turn the valve to vent

books

Anonymous (anonymous@undisclosed.example.com) — 2007-04-23T12:05:13+00:00

Books Upload here books that are available in electronic format. Make new sessions when needed. SPM for starters * SPM basics, book. * SPM basics, short book.

bruker_dektakxt_profilometer

Anonymous (anonymous@undisclosed.example.com) — 2023-03-15T14:36:16+00:00

Stylus part number: 838-031-5, 2 µm, B-type Common problems It is important to turn on the machine before you start the software, otherwise the software will crash. Tower not moving down or moving extremely slowly Use the Reset Dektak button on the toolbar.

cables_and_connectors

Anonymous (anonymous@undisclosed.example.com) — 2008-04-03T10:30:35+00:00

* Coax cables * Multipole * Filters and shells

coax_cables

Anonymous (anonymous@undisclosed.example.com) — 2008-04-03T10:33:07+00:00

BNC with Belden Conformable 1673A This is a design to be able to use a Radiall R141007000W BNC cable connector with a RG402/U compliant cable, especially designed for Belden Conformable 1673A. Assembly instructions * To assemble this connector you need a 3 pieces of the Radiall R1411007000W BNC connector:

conference_talks

Anonymous (anonymous@undisclosed.example.com) — 2011-05-19T08:12:10+00:00

Spin Caloritronics III, Lorentzcenter 9 May 2011 through 13 May 2011 Spin caloritronics is about the physics and control of heat, charge and spin currents in structures, devices, and materials. This topic has been launched in 2009 at the Lorentz Center. The societal relevance of the topic is given by the imminent breakdown of Moore’s Law due to a thermodynamic bottleneck: further decrease in feature size and transistor speed goes in parallel with intolerable levels of Ohmic energy dissipation a…

contacting_flakes_with_lithography

Anonymous (anonymous@undisclosed.example.com) — 2025-03-10T13:18:47+00:00

Exfoliation The Standard Way of exfoliating flakes is based on the seminal work on by Novoselov and Geim et al. (). Many crystals can be exfoliated, but of course layered materials with only a weak van der Waals bonding between layers (aka van der Waals materials) are easiest. This manual assumes starting with a bulk crystal and working in the cleanroom.

creating_optical_masks

Anonymous (anonymous@undisclosed.example.com) — 2016-09-14T12:58:58+00:00

Warning: experimental procedure Several problems have been encountered while trying to create a glass mask. These problems may prevent you from succesfully creating a mask. * The glass was too thin, combined with being slightly smaller than 50*50mm. This resulted in movement of the glass during exposure. The glass needs to be atleast 1.56mm thick, but preferably not much thicker than this.

cressington_sputter_coater_208hr

Anonymous (anonymous@undisclosed.example.com) — 2015-08-10T08:04:57+00:00

Description Manual Sample Loading * Lift the top plate and remove the glass cylinder. Take care that the top-plate does not fall forward. The target can be damaged by striking the sample table. * Place your sample, mounted on a stub, on the stage.

cu_50ni_50

Anonymous (anonymous@undisclosed.example.com) — 2011-06-06T16:05:51+00:00

Properties Cu_50Ni_50 Target composition 50/50 (atomic) Sample composition 43/57 TCurie 150 K Polarisation ~0% Sources [1] Proximity effects in superconducting spin-valve structures, thesis Machiel Flokstra (2010)

deposition_processes_and_rates

Anonymous (anonymous@undisclosed.example.com) — 2025-04-01T16:15:26+00:00

A note about deposition The sputtering of thin films has some advantages over vapor deposition: * Sputtered films adhere more strongly to substrates than vapor deposited films, due to the high kinetic energies with which the atoms impinge upon the substrate (1-100 eV for sputtering, 0.1-0.5 eV for evaporation).

dishwasher_cleanroom

Anonymous (anonymous@undisclosed.example.com) — 2023-03-16T07:39:30+00:00

Manual of the dishwasher: [manual] Common problems, tips and tricks Error no chemical load 1/2 reset the dishwasher if this doesn't work try running the loading relays for the chemicals manually: * password to access utility menu: “123” * chemical 1 load output relay: 11

douwe_scholma

Anonymous (anonymous@undisclosed.example.com) — 2018-05-03T13:39:26+00:00

Douwe Scholma Office: Huygens 609a Phone: +31 71 527 5448

e-beam_evaporator

Anonymous (anonymous@undisclosed.example.com) — 2025-12-03T16:13:26+00:00

Plassys MEB600SL E-beam evaporator Introduction The e-beam evaporator is a high vacuum deposition machine that heats materials with an electron beam. Due to the heat, the vapor pressure will increase until it has reached a value above the background pressure in the chamber (~1e-8 mbar), after which the vapor particles will be forced to move due to the pressure gradient arising. This creates a flux of vapor particles moving toward a substrate. The substrate on which the vapor is deposited is ro…

ebpg_graphic_manual

Anonymous (anonymous@undisclosed.example.com) — 2025-11-06T23:50:19+00:00

EBPG Raith 100 Pictured Manual This is a pictured user's guide for the Raith 100 e-beam pattern generator (EBPG). The condensed version can be found here. Control Software You will use three different programmes when operating the EBPG: * e_line, which controls the actual patterning

ebpg_raith-100

Anonymous (anonymous@undisclosed.example.com) — 2025-07-29T10:30:37+00:00

Raith 100 E-beam Lithography (EBL) Introduction The Raith 100 is a direct-write machine used for maskless lithography. A 30 keV electron beam is emitted from a field-emitter, and is focused through electromagnetic lenses. Using a deflection system the beam can be moved in the xy-plane. Lithography is crucial for the

electron_beam_lithography

Anonymous (anonymous@undisclosed.example.com) — 2008-06-03T10:54:13+00:00

Introduction E-beam lithography is not something you will learn in a day. You will have to know about SEM use, structure design, resist chemistry and processes, etching processes, proximity effect, alignment, EBPG use etc. etc. The first step is to get experienced with SEM operation.

equipment_manuals

Anonymous (anonymous@undisclosed.example.com) — 2025-07-29T10:16:08+00:00

Important! Before operating an apparatus yourself you should have received instructions and you should have done the whole procedure several times yourself while supervised by someone qualified to use the apparatus. These manuals are by no means a 'go flag' to start experimenting on your own!

facilities

Anonymous (anonymous@undisclosed.example.com) — 2025-07-29T10:16:57+00:00

NanoLab facilities Sputtering * FIXME UHV (4-magnetron targets, incl. loadlock) * FIXME Z-406 (3-target diode sputtering system) * FIXME Z-407 (3-target diode sputtering system) * FIXME Off-axis (4-source, reactive sputtering for the epitaxial growth of perovskites)

fei_nanosem_200

Anonymous (anonymous@undisclosed.example.com) — 2017-04-03T12:41:11+00:00

Description The FEI NanoSEM is a Schottky field emitter SEM that has very high resolution down to low accelerating voltages, thanks to the UHR immersion mode in which the focussing field(gradient) extends below the pole piece of the final lens so that the specimen can be placed 'in' the lens at very small working distance.

filters_and_shells

Anonymous (anonymous@undisclosed.example.com) — 2008-04-03T10:38:59+00:00

Feed Thru Capacitor This filter box is used to prolongue the insert connector box to house a feed-thru capacitor and a resistance in series. A ground plane divides the outer part of the experiment to the inner part: the inner part is the filtered one.

glovebox

Anonymous (anonymous@undisclosed.example.com) — 2023-03-21T14:29:17+00:00

Glovebox The Glovebox is located on the 7th floor of the Huygens in HL713a. The manual can be found here, it's recommended to read chapter 5: The glovebox is capable of keeping O2 and H2O levels below 1ppm. O2 and H2O levels can be read out on the display on the top right. The system is equipped with a large and small antechamber, a gas purification system and vacuum pump to minimize concentrations of O

group_meeting_talks

Anonymous (anonymous@undisclosed.example.com) — 2011-06-30T07:35:57+00:00

Group Meeting talks * Marcel Hesselberth (PPL talk) Numerical sputtering * Chris Bell et al Development of CPP structures: tunnel junctions, 31 Aug 2005 * Machiel Flokstra et al Mysteries of F/S systems, 31 Aug 2005 * Carla Cirillo et al

install_labview_8.0_on_linux_gnu_debian_3.1

Anonymous (anonymous@undisclosed.example.com) — 2007-02-02T10:43:43+00:00

* Install Debian GNU/Linux 3.1r4 (actual stable release, january 2007) * install package alien * install KDE and/or GNOME (LabVIEW says it has desktop integration with this two) * copy the LabVIEW installation CD on the hard disk (i.e. /root/labview) * issue

ion_beam_etcher

Anonymous (anonymous@undisclosed.example.com) — 2025-12-02T14:12:24+00:00

Description The Ion Beam Etcher has a collimated monochromatic broad-beam ion source (Kaufman type) that can be used for ion etching / ion milling. The beam diameter is 4 cm. Working pressure is 3-4 e-4 mbar. The maximum beam current is 10 mA and the maximum energy is 1500 eV. For resist processing typically low energies are used to avoid damage to the imaging resist.

ion_etching_recipes_and_rates

Anonymous (anonymous@undisclosed.example.com) — 2004-12-12T15:35:01+00:00

Recipes Experiments with photoresists (that polymerize and become more or less unremovable at relatively low temperatures i.e. 110 C) without N2 cooling have led to the famous 'recipe #10'. This recipe gives a maximum etch rate without destroying optical resists. Other recipes have lower currents to reduce oxygen loss in oxides. Recipe #10 basically means a 350 eV collimated Ar

jeol_820_sem

Anonymous (anonymous@undisclosed.example.com) — 2008-05-29T15:59:39+00:00

Description The JEOL 820 Scanning electron Microscope is a tungsten emitter SEM with a typical resolution <10 nm. The system has a SE and a BSE detector. It is mostly used for electron beam lithography, for which it has been equipped with a motorized stage and a beam blanker. The beam writing is performed by a 300 kHz Elphy Quantum pattern generator with 16 bit resolution in the X and Y direction and electronic beam rotation and scaling via multiplying DAC's. This system routinely writes 70 nm …

k-cell_evaporator

Anonymous (anonymous@undisclosed.example.com) — 2010-04-01T15:30:38+00:00

Description The K-cell evaporator is equipped with a Riber cell with a PBN crucible. The maximum temperature is 1350 C. The system is pumped with a turbo pump and can achieve a pressure in the 1e-8 mbar range after bake out (5e-7 without baking and 1 day of pumping). The system has a programmable Eurotherm temperature regulator and a manually operated shutter.

labview_drivers

Anonymous (anonymous@undisclosed.example.com) — 2007-04-19T09:03:02+00:00

* Check your serial port LV 8.0 Linux * Oxford Instruments Magnet Power supply LV 8.0 Linux * Elektronikka AVS47 LV 8.0 Linux * Rohde & Schwarz [SMS Signal generator] 0.1 - 520 MHz. LV 8.0 Linux * PPMS * PPMS * PPMS * PPMS * PPMS * PPMS * PPMS * PPMS * PPMS * PPMS *

labview_ppms

Anonymous (anonymous@undisclosed.example.com) — 2007-02-16T15:08:52+00:00

LabView Interface for Quantum Design Physical Properties Measurement System (PPMS) These VIs are shareware. If you find them useful, please make a voluntary contribution ($15 suggested donation) to the Amherst College Physics Department. The funds will be used to support undergraduate research and entertainment (e.g. pizza). Please send your check to

labview_tips_tricks

Anonymous (anonymous@undisclosed.example.com) — 2007-04-26T08:08:17+00:00

* use external routines in LabVIEW

latex_links_and_examples

Anonymous (anonymous@undisclosed.example.com) — 2006-01-24T14:44:00+00:00

Using different style files If you do not permission to add new style files to the latex directory, (probably found at something like c:\Program Files\texmf\tex\latex\base and/or c:\Program Files\texmf\tex\generic\babel ) then instead you can just load the style file into the same directory as your .tex document, (if you download it, remember to save it with the extension option 'all files' and ending with .sty, and NOT .txt, or it won't work).

lindberg_blue_tube_oven

Anonymous (anonymous@undisclosed.example.com) — 2023-03-31T09:20:14+00:00

Oxygen and Argon tube oven annealing The tube oven has a temperature range of up to 1100 °C and can fit 26mm diameter tubes. Temperature regulation is done by a Lindberg/Blue UP150 controller. Oxygen and Argon can be connected separately or mixed. Setting the gas flows is done via a needle valve separately for O2 and Ar.

lv_debian

Anonymous (anonymous@undisclosed.example.com) — 2007-02-02T10:46:26+00:00

This small HOWTO is to help in installing LabVIEW on a Linux machine. * Install Debian GNU/Linux 3.1r4 (actual stable release, january 2007) * install package alien * install KDE and/or GNOME (LabVIEW says it has desktop integration with this two) * copy the LabVIEW installation CD on the hard disk (i.e. /root/labview)

magnet_power_supply

Anonymous (anonymous@undisclosed.example.com) — 2007-02-21T15:06:17+00:00

LabVIEW 8.0 There are various vi-s: [GotoField6.vi] suitable to drive a magnet without persistent mode. Subvi-s called by GotoField6.vi: * [edo_MAG_init.vi] initialize computer's serial port * [edo_MAG_wrt.vi] writes a buffer to serial port * [edo_MAG_rd.vi] reads from the serial port. * [edo_magnet_status.vi] reads the status of the Magnet Power Supply

marcel_hesselberth

Anonymous (anonymous@undisclosed.example.com) — 2009-06-17T15:40:23+00:00

Contact Marcel Hesselberth Magnetic and superconducting materials group Niels Bohrweg 2 NL-2333CA Leiden Netherlands phone: ++31 (0)71 527 1887 mobile: ++31 646 29 59 00 fax: ++31 (0)71 527 5404 e-mail: Location: Huygens Laboratory, room 609a Download If you want to download my electronic vcard to enter the above information easily in your mail program or organizer, click

mask_aligner

Anonymous (anonymous@undisclosed.example.com) — 2022-06-15T12:36:32+00:00

Link to the manual: [manual] Prepare your sample * clean your sample * turn on hot plate to 80 degrees * spin coat sample with OIR917 on recipe 2 * bake sample on hot plate for 1 min start * turn on the lamp using instructions on the machine *

med010

Anonymous (anonymous@undisclosed.example.com) — 2012-09-20T14:43:41+00:00

Description * very easy & fast to use, for, e.g., SEM sample metallization * background pressure: <1E-6mbar, 650V, <150mA, 54mm targets * no substrate cooling Manual Start up & Loading sample * Open N2 line at the wall 1/2 turn (check pressure reducer)

mpms-5s

Anonymous (anonymous@undisclosed.example.com) — 2012-02-24T11:44:07+00:00

MPMS-5S manual (version 1.4, 22-06-2007) Requirements to ALL users 1) Every user is REQUIRED to report any problem that appears during the measurements. If there is a hardware problem write it (in understandable English) in the logbook; next to the MPMS and report it as soon as possible. 2) Every user is REQUIRED to start a new log file at the beginning of his measurement day. If the measurements are performed by the same user in successive days only one file is enough. The files should be sa…

mpms-5s_helium_transfer

Anonymous (anonymous@undisclosed.example.com) — 2008-10-01T13:05:47+00:00

MPMS-5S Helium transfer The Squid should be refilled if Helium levels are below 50% Filling * Make sure you have a helium vessel that still has enough (what is enough?) helium * Close all valves of the vessel * Attach hose to compressor and vessel.

mpms-xl

Anonymous (anonymous@undisclosed.example.com) — 2007-08-15T08:03:19+00:00

MPMS-XL manual (version 1.3, 03-11-2006) Requirements to ALL users 1) Every user is REQUIRED to report any problem that appears during the measurements. If there is a hardware problem write it (in understandable English) in the logbook; next to the MPMS and report it as soon as possible.

mpms_helium_transfer

Anonymous (anonymous@undisclosed.example.com) — 2007-08-15T08:05:55+00:00

MPMS helium transfer About Helium Transfer The following procedure is recommended for initial and subsequent transfers. We have made appointments for the ordering of Helium at the cryogenic department of Hans van Kuyk. When you get the vessel, please book it under

nanolab

Anonymous (anonymous@undisclosed.example.com) — 2025-11-28T14:30:27+00:00

Welcome to the NanoLab! New to the LION NanoLab NanoLab The NanoLab hosts shared facilities that are part of Leiden Institute of Physics. The NanoLab equipment for thin film deposition, lithography, etching, inspection and other processing equipment can be found on the Facilities page. If you want to use the equipment, you can find contact information on the webpage of the equipment.

nbn

Anonymous (anonymous@undisclosed.example.com) — 2005-02-15T14:36:25+00:00

NbN NbN is a strong pinning superconductor with a relatively high Tc. Sputtering NbN can be reactively sputtered by adding N2 to the sputtering gas. * Links to papers about the hysteresis loop of reactive sputtering come here * Links to papers about reactive NbN sputtering go here

nikon_eclipse_lv150_optical_microscope

Anonymous (anonymous@undisclosed.example.com) — 2024-12-18T12:30:59+00:00

Nikon ECLIPSE LV150 optical microscope Manufacturers Manual: [Nikon ECLIPSE LV150 Optical Microscope]. Lamp The microscope lamp is a (LV-HL50W) 12V50W halogen lamp with uniform light intensity distribution across the filament area. Filament-based lamps have a finite life-time, so make sure to turn off the light

old_rates_atc

Anonymous (anonymous@undisclosed.example.com) — 2013-09-12T09:17:26+00:00

Material Date Sample ID Process parameters Measured with Result Rate AgMn 20070305 AgMn 74 min 10 mTorr, 50 mA, 74 min X-ray 51.0 nm 0.688 nm/min Au

optical_lithography

Anonymous (anonymous@undisclosed.example.com) — 2019-10-08T09:41:03+00:00

Description Warnings * Don't make mess, clean everything after use. * Switch off the lamp of the mask aligner, it has a limited lifetime. * It is not allowed to take masks out of the cleanroom. To start * Because the UV lamp needs some time to warm up, you should switch on the mask aligner first.

optical_lithography_recipes

Anonymous (anonymous@undisclosed.example.com) — 2007-11-28T13:43:49+00:00

Processes The masks are designed such that positive resists can be used. AZ5214 can also be used in 'image reversal' mode (that requires a reversal bake and a flood exposure). The optical resist processes are very uncritical because we make all small features with the e-beam.

oxides_system

Anonymous (anonymous@undisclosed.example.com) — 2013-02-27T09:09:11+00:00

Description The oxides sputtering system is a epitaxial-growth high-pressure non-magnetron sputtering system with specially adapted sources that operate at pressures up to 5 mbar! The background pressure is typically <1e-6 mbar after a night of pumping and 1e-7 mbar is the minimum. The system is equipped with a 1200 C substrate heater that can rotate over the sources. Oxides are sputtered reactively, a 3-gas blending system for Ar, 0

oxide_ybco

Anonymous (anonymous@undisclosed.example.com) — 2012-12-10T14:40:08+00:00

YBCO growth The most complex process is YBCO growth. That process is described here. Switch off the pumps * Check whether all gas inlet valves are closed * Close the gate valve * Switch off the pumps with the central pump switch * Switch off the cooling water

plasmalab_90

Anonymous (anonymous@undisclosed.example.com) — 2018-06-08T07:06:10+00:00

Description The Oxford PlasmaLab 90+ is a parallel plate etcher in the RIE configuration with a grounded upper electrode through which gas is injected and a RF driven lower electrode of which the RF power or self-bias can be set. 6 gas channels are available, gases can be mixed with MFC's, process pressure is regulated by feeding the value from the gas-independent baratron (diaphragm gauge) to an MKS control valve that throttles the turbo pump. Substrate temperature can be set from 0-60 C.

plasmalab_90_logbook

Anonymous (anonymous@undisclosed.example.com) — 2006-09-11T16:30:44+00:00

TODO * Chiller temp can be measured (D connector has 0-10V in and out, conversion to C has a weird 10C offset) build thermometer for this * Install new baratron (expected 20060915) * Connect pump exhaust, gaspod and gas cabinet to building exhaust (vastgoed)

plasma_cleaner_pdf-32g-2

Anonymous (anonymous@undisclosed.example.com) — 2023-02-24T07:56:39+00:00

Plasma Cleaner manual [Plasma Cleaner manual] DO's and DONT's Only use bare substrate in the plasma cleaner, all exceptions should be discussed. * Si * SiO2 * glass/quartz MANUAL * Load samples on the sample tray * Start the vacuum pump while holding the door, make sure black valve is pointing down

ppms

Anonymous (anonymous@undisclosed.example.com) — 2007-07-04T09:55:27+00:00

PPMS version feb 2007 Resistivity Measurements Before placing any puck inside the chamber, check the contact resistance: A - Plug the puck with the samples mounted into the testing station and insert the resistivity plug into the testing station.

ppms_chamber_status.vi

Anonymous (anonymous@undisclosed.example.com) — 2007-02-16T13:43:38+00:00

PPMS chamber status.vi VIs that report the status(changing, stable, error) of some physical property have the name of the property followed by the word “status”. For example: “PPMS chamber status.vi” reports back whether the chamber is sealed, pumping continuously, purging, etc

ppms_controller.vi

Anonymous (anonymous@undisclosed.example.com) — 2007-02-16T13:45:05+00:00

a VI that pulls all the other VIs into a single front panel. This is an adequate replacement for the MultiVu software when performing simple tasks like changing the temperature and field or installing a sample or putting the unit into standby. This VI requires every other VI in the library and is contained in it.

ppms_helium_transfer

Anonymous (anonymous@undisclosed.example.com) — 2007-06-25T10:15:01+00:00

(from PPMS Service Note 1070-601, adapted, version 1.0 03-01-2006) Helium Transfers on the Cold Dewar Before attempting to transfer helium into the PPMS system, be aware of the precautions and hazards associated with liquid helium: the extremely cold liquid and gas can cause serious burns

ppms_shutdown.vi

Anonymous (anonymous@undisclosed.example.com) — 2007-02-16T15:01:06+00:00

used to put the PPMS into standby mode

ppms_wait_for_stable_temp.vi

Anonymous (anonymous@undisclosed.example.com) — 2007-02-16T14:59:36+00:00

a VI that will wait up to a certain amount of time for the temperature to stabilize.

processes

Anonymous (anonymous@undisclosed.example.com) — 2005-02-10T09:24:26+00:00

Materials * Ag2S * NbN

process_designs

Anonymous (anonymous@undisclosed.example.com) — 2004-12-06T02:23:54+00:00

Process designs Al/Py AMR structure Al/Py spin switch structure

projects

Anonymous (anonymous@undisclosed.example.com) — 2006-10-12T09:40:04+00:00

These projects would significantly improve the thin film infrastructure. Processes MoGe It should be possible to sputter MoGe in the ATC. Also Nb Tc should be > 8K. NbN can be better. These issues should be investigated. Au Good Au recipes are available in ATC. Check dependence of Au growth on some parameters. Hypothesis of flattening by O2 because of 'reverse sputtering' might be unlikely but this can be tested in the ATC. Try DC bias. I think adatoms might be important.

publications

Anonymous (anonymous@undisclosed.example.com) — 2010-08-26T15:41:52+00:00

Publications

relevant_literature

Anonymous (anonymous@undisclosed.example.com) — 2014-04-11T12:50:30+00:00

MOO

relevant_literature_new

Anonymous (anonymous@undisclosed.example.com) — 2008-12-04T17:07:37+00:00

Relevant Literature Here you can find the literature relevant for the research and developments carried out in the MSM group. Everyone in the MSM group can upload in this section, as long as the papers/books/reviews are really relevant. Upload them in the

resistance_evaporator_manual

Anonymous (anonymous@undisclosed.example.com) — 2022-06-08T15:17:10+00:00

Resistance evaporator manual Description The resistance evaporator is configured for evaporating 3 different materials with a chamber background pressure off ~5e-8mbar. It is equipped with a crystal thickness monitor below the shutter to set stable conditions, monitor deposition rate during the process and determine total evaporated thickness.

resist_and_e-beam_recipes

Anonymous (anonymous@undisclosed.example.com) — 2018-11-19T08:32:50+00:00

General A resist is a material that changes its property upon exposure, most e-beam resists undergo a chemical change because of the electron radiation damage and can also be exposed by deep UV and X-ray radiation; they are insensitive to near UV and daylight.

safety_and_lab_regulations

Anonymous (anonymous@undisclosed.example.com) — 2023-03-27T11:26:22+00:00

Safety Everyone working in the NanoLab should have received the LION safety regulations and have read them thoroughly. ([ ). The faculty course about chemical safety should be followed as well as the fire extinguishing drill (follow these at the first opportunity).

serial_port

Anonymous (anonymous@undisclosed.example.com) — 2007-02-16T09:04:48+00:00

[This vi] writes and reads from the same serial port. It is enough to shortcut the pin 2 and 3 (on a pin 25 connector, maybe also on a pin 9). You write on the port and you read what you wrote.

siemens_d5005_reflectometry

Anonymous (anonymous@undisclosed.example.com) — 2007-08-29T12:22:56+00:00

Siemens D5005, measurement of thin film thickness using Xray reflectometry. The Siemens D5005 x-ray diffractometer makes use of very narrow collimated x-ray beams of high intensity. Exposure of the eyes or the skin of the body to the primary x-ray beam may result in severe radiation burns in a matter of seconds. Never try to bypass the electrical safety circuit! In case of malfunctions, call Bruker-AXS in Delft.

software_and_computers

Anonymous (anonymous@undisclosed.example.com) — 2007-04-26T08:07:42+00:00

* Install LabVIEW 8.0 on Linux GNU/Debian 3.1 * How to reach the meetnet and viceversa, with OpenSSH * Proxy server with OpenSSH * LabVIEW drivers * LabView PPMS * LabVIEW tips&tricks

spin150i_polos_spin_coater

Anonymous (anonymous@undisclosed.example.com) — 2025-09-11T09:02:31+00:00

Manual: Quick reference quide:

spin_coater

Anonymous (anonymous@undisclosed.example.com) — 2017-02-08T13:49:55+00:00

Description The spin coater in the cleanroom can be used for spin coating resists only. Manual * Cover the spin bowl completely with aluminium foil * Switch on vacuum (black button) * Push 'change pre' and select a recipe * Clean bottom of sample, place it (centered) on the chuck

ssh_meetnet

Anonymous (anonymous@undisclosed.example.com) — 2007-02-16T09:17:14+00:00

How to connect to the meetnet Original instructions. Since on the measurement machines not only system management have the Administrator password, the measurement machines are put on a different network respect to the offices' one: the meetnet. In particular you cannot move the experimental data from the measurement machine to you office via network, you cannot print and so on.

start

Anonymous (anonymous@undisclosed.example.com) — 2025-03-31T12:40:22+00:00

The MSM wiki The MSM wiki is a system of web pages that can be read, improved and extended by everyone who has access to them and functions as the group's common knowledge base. Access is limited to selected local users only. Sample fabrication * Equipment manuals *

student_reports

Anonymous (anonymous@undisclosed.example.com) — 2012-08-28T12:59:28+00:00

This page is intended for old reports which can be used as reference. Please include both the original .tex and the complete document (.pdf, or .ps) when adding reports. * Christianne Beekman, master thesis Superconducting properties of Py/Al structures

targets

Anonymous (anonymous@undisclosed.example.com) — 2011-06-06T15:59:15+00:00

Material Purity diameter reference AgMn Ag 5 cm Ag Z400 Al 5 cm Al

temp_calibration.vi

Anonymous (anonymous@undisclosed.example.com) — 2007-02-16T15:02:20+00:00

a VI that can be used to calibrate new thermometers, thermistors, etc. Note that this VI requires both resistivity VIs and all the temperature VIs in addition to the VI listed below. temp calibration sweep.vi - a subVI required for temp calibration to work. PPMS resistivty initialize.vi - VI that sets the current and power limits for the bridge channels. This must be done before a bridge channel can be used for measurements.

thermcraft_tube_oven

Anonymous (anonymous@undisclosed.example.com) — 2023-03-15T14:11:04+00:00

Tube oven annealing The tube oven has a temperature range of 50-1200 °C and can fit 1 inch diameter tubes. Temperature regulation is done by a Eurotherm 2404 controller. Three different process gasses can be connected, at the moment H2 and Ar are connected. Gas flow of each gas is controlled by a mass flow controller (MFC), mixing is possible. A dry vacuumpump is used to pump down the system, lowest pressure that can be achieved is roughly 1e-2mbar. A pressure control valve can be used to cont…

thermofisher_apreosem

Anonymous (anonymous@undisclosed.example.com) — 2025-05-02T11:27:13+00:00

Instructions.txt - Use gloves and mount sample on a semstub (either carbon- or coppertape, or carbonpaint) - Big sized objects (in vertical direction!!) or heavy objects should be discussed with a technician (see contacts below!). - Check the CCD camera and look if something is off (other samples in or stage tilted etc.), check previous logbook entry for any comments.

uhv_system

Anonymous (anonymous@undisclosed.example.com) — 2025-10-29T16:07:47+00:00

Description The UHV system is a magnetron sputtering system with a background pressure around 10e-10 mbar and a deposition pressure of 1e-3 to 1e-2 mbar. It is equipped with a loadlock that holds a sample garage with 7 sample spaces. One sample space can hold a 15x15mm wafer. The substrate is transferred to and from the chamber using two linear manipulators and a wobble stick. Most targets in the chamber are at an angle with respect to the sample, and the sample can be tilted towards 3 out of 4…

vcn_info

Anonymous (anonymous@undisclosed.example.com) — 2005-06-27T09:44:21+00:00

VCN Info if you want to transfer data from a PHYSICS computer system to a computer outside the PHYSICS domain (no matter where it is) or if you want to work from home (or whereever) on your PC at work (to read papers etc) you can use the following recipe:

wet_etching_recipes_and_rates

Anonymous (anonymous@undisclosed.example.com) — 2006-11-10T16:36:21+00:00

Materials Material Etchant Temperature Rate Al Alkalies, i.e. AZ312MIF:H2O 1:1 RT ? nm/min MoGe 75% H3PO4 + 23% H2O + 2% HNO3

wiki

Anonymous (anonymous@undisclosed.example.com) — 2015-10-07T09:33:11+00:00

A wiki or wikiwikiweb is a website that can be modified by everyone. The wikiengine of the NanoLab wiki is dokuwiki, a free groupware documentation system. The system keeps a complete revision log of the changes that are made and logs who has updated which files.

wire_bonder

Anonymous (anonymous@undisclosed.example.com) — 2025-04-17T12:56:21+00:00

K&S-4700 Convertible Dual Wire Bonder Introduction Wire bonders literally bridge the gap from nano- and micro-structured patterns to millimeter-sized devices, by allowing the user to weld a conductive wire between the two 'domains'. At its core, wire bonding is a form of solid-state welding—a process in which two materials are joined without melting, relying instead on pressure, friction, and sometimes heat to form a metallurgical bond.

working_with_chemicals

Anonymous (anonymous@undisclosed.example.com) — 2023-02-14T15:17:09+00:00

Working with chemicals

z-400

Anonymous (anonymous@undisclosed.example.com) — 2025-02-11T08:01:09+00:00

Description The Leybold Z-400 is an RF diode sputtering system equipped with 3 3“ targets. It has a background pressure of 1e-5 mbar and a deposition pressure of ca. 5e-3 - 8e-2 mbar. The 2 substrate tables are water cooled and can hold substrates up to 3

z-400_flat_au_on_moge

Anonymous (anonymous@undisclosed.example.com) — 2014-08-15T11:58:40+00:00

Flat Au on MoGe Recipe for flat Au: 25% Ar, 39% O2, 1 kV (for avoiding oxidation of interface: first 8 sec without O2) * Note background pressure in logbook. * Switch on cooling water (blue button). * Check the timings and positions for the (pre) sputtering,

z-407

Anonymous (anonymous@undisclosed.example.com) — 2018-11-06T14:10:27+00:00

The Z407 Automatic sputter system is located in the sputterlab at the 6th floor. The system is designed to work with a background pressure <1E-5 mBar but can be as low as 5E-7 mBar. The usable gases are Ar, N2 or O2. step 1: check if somebody is using it, and if the desired target is in.