NanoWiki

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… tried to write the “cross” again using 2-layer resist.

… tried to write the “cross” structure with e-beam with partial success. The small structure was written (pictures will follow), but for the larger “contact pads” the incorrect magnification (=field of view) was chosen. Therefore they are not large, but rather small and disconnected from the small structure. From the optical microscope look at the sample it looks like there is quite some undercut of PMMA even on this single-layer resist, suggesting that the doze might be too high. Also there is quite a few pinholes in PMMA, which could be the reason why we keep getting conduction through PMMA. On Monday we'll try to make pictures of the small structure and see exactly how much the undercut is. - Sander & Alex

• An excellent starting point: http://msm09.physics.leidenuniv.nl/dokuwiki/doku.php?id=resist_and_e-beam_recipes
• A short list of e-beam resists with description and recipes: http://www.cnf.cornell.edu/ebeam/resist.html
• A whole list of courses on nano-everything: http://www.cnf.cornell.edu/nanocourses/2004/main.htm. You should first get the notes of a Section, and then watch the video (looking at your notes!)
• A whole chapter on e-beam lithography from a book: http://www.cnf.cornell.edu/spiebook/toc.htm#chap2