With the MoGe target still ignited, move the target over your samples and time the deposition
Move back the MoGe target to pre sputter position and set HV setpoint to zero and switch off HV (red HV off
button)
Select Au target with HV target selector knob (left of the chamber).
Set the Au target to the pre sputter position.
Set the DC voltage meter to 1 kV full scale (right display).
Turn the HV setpoint to zero (black knob on power supply).
Turn HV on (two on/off buttons).
Set 500 V RF (2nd display from the left, 5 kV scale).
Increase the flow setpoint temporarily to 75 sscm and check that the pressure rises.
Wait until the plasma ignites (right display shows non-zero value).
Quickly check that the ignited target is at pre sputter position (look through window, purple glow at front position).
Next set the flow to the original value and check that the pressure stabilises at 5E-3 mbar.
Set the DC potential to the desired value (typically 1 kV).
With the pressure and the plasma stable, move the target over your samples and time the deposition
After 8 seconds blend in O2 by setting the O2 flip switch to the middle
position again
Finish deposition and move target to pre sputter position
Set the O2 flip switch to down
position
Wait for the flow to be < 1% and switch off MFC electronics
Set HV setpoint to zero and switch off HV (red HV off
button)