Deposition date: 20060511

Target: Pr0.5Ca0.5MnO3compound target
Substrate: STO
Pressure: 3 mbar O2
Flow: 40 ml/min
Current: 200 mA
Voltage: 449 V
Time: 75 min
Temp: 840 C
Remarks: -
XRR:
Results 12nm
RBS:
Run:
File:
Result: