The oxides sputtering system is a epitaxial-growth high-pressure non-magnetron sputtering system with specially adapted sources that operate at pressures up to 5 mbar! The background pressure is typically <1e-6 mbar after a night of pumping and 1e-7 mbar is the minimum. The system is equipped with a 1200 C substrate heater that can rotate over the sources. Oxides are sputtered reactively, a 3-gas blending system for Ar, 02 and N2 is mounted as well as special gas inlets for annealing. The power supplies are 2 slow-ramping DC supplies and a self-matching RF supply.
Safety issues for yourself and for the system:
Lift
main switchSPI silver paste plus II
(should be kept in freezer, warm up before use) and squeeze the substrate against the heater with the glass tool (clean before use)Material | Date | Sample ID | Process parameters | Measured with | Result | Rate |
---|---|---|---|---|---|---|
LCMO | 20060918 | L408 | 3 mbar, 350mA ,384V | X-ray | 45 nm | 1.21 nm/min |
Pt | 20120711 | Pt-01 | 1 mbar, 35mA, 603V, 19W, 15min | X-ray | 11.5 nm | 0.766 nm/min |
LAO | 20121210 | from Ishrad | DC 0.8 mbar, 30W | ~0.18 nm/min |