Resist | Spin coater | Baking | Developing | Remarks |
---|---|---|---|---|
AZ5214E | 4000/6000rpm | 90 C, 2.5 min | 50% AZ312MIF + 50% H2O, 40 s | - |
HPR205 | 4000/6000rpm | 90 C, 2.5 min | 50% AZ312MIF + 50% H2O, 40 s | - |
MaN1410 | 3000rpm,30-45 s | 90 C, at least 90 s | MaD533, 15 s | negative photoresist |
MaP1205 | 4000/6000rpm | 100 C, 30 s | 90% MaD532 + 10% H2O, 30 s | 100% MaD532 can also be used, takes 10-15 s |
Removing resist after etching and lift-off can be done in acetone.
The mask aligner uses 2.5“ masks. We order 5” masks in Twente so that's 4 2.5“ masks. You can design masks with the program clewin. Click on the link to get it: clenwin.zip
Lamp type: 030W7 HBO 200W mercury vapor lamp