Several problems have been encountered while trying to create a glass mask. These problems may prevent you from succesfully creating a mask.
The glass was too thin, combined with being slightly smaller than 50*50mm. This resulted in movement of the glass during exposure. The glass needs to be atleast 1.56mm thick, but preferably not much thicker than this.
Some dust came onto my glass plate during spinning or baking. After removing the resist with NMP, also the MoGe got damaged during the cleaning process. This resulted in charging effects. Never recycle a dirty piece of glass, use a new one instead. It may be usefull to sputter a conducting layer on several at once.
Another piece of glass had damaged spots, which were not immediately visible. I only noticed 'comets' in the resist while spinning/baking. The damaged spots were easily visible under the microscope, even without resist. It's recommended to use high quality (polished) glass, which may have to be ordered elsewhere, and it's also recommended to examine the glass under the microscope before sputtering, to reduce time loss.
For an unknown reason, one of the lines on the sample got an interuption in it after exposure. Always examine your mask after development, but before sputtering. This has been fixed by locally exposing this spot again and developing again. Possible ways to prevent this is make sure that you're sample is absolutely clean, or by writing 2 lines with half the width next to each other (so if one gets interupted, the other one will still make contact). Also a slightly higher dose may help.