===== Flat Au on MoGe =====
Recipe for flat Au: 25% Ar, 39% O<sub>2</sub>, 1 kV (for avoiding oxidation of interface: first 8 sec without O<sub>2</sub>)

  - Note background pressure in logbook.
  - **Switch on cooling water (blue button)**.
  - Check the timings and positions for the (pre) sputtering, **note this in the logbook**.
  - Switch on power supply (red turning knob). It takes 2 minutes for the RF generator to warm up.
  - Set the Argon flow setpoint (using the software, usually around 30-50 sccm) and set the MFC valve to 'Normal'.
  - Check that the desired pressure is reached (typically 5E-3 mbar), if not adjust the flow accordingly.
  - Switch on the mass flow controller electronics (for the O<sub>2</sub> and N<sub>2</sub> MFC's)
  - Select the channel for O<sub>2</sub> on the electronics
  - Set the flip switch for O<sub>2</sub> to the ''middle'' (regulating) position and set 39% with the potentiometer knob
  - After the flow has stabilised, leave the flow settings as they are and put the flip switch in ''down'' position (close)
  - **Pres puttering**
       - Select Au target with HV target selector knob (left of the chamber).
       - Set the Au target to the pre sputter position.
       - Set the DC voltage meter to 1 kV full scale (right display).
       - Turn the HV setpoint to zero (black knob on power supply).
       - Turn HV on (two on/off buttons).
       - Set 500 V RF (2nd display from the left, 5 kV scale).
       - Increase the flow setpoint temporarily to 75 sscm and check that the pressure rises.
       - Wait until the plasma ignites (right display shows non-zero value).
       - **Quickly** check that the ignited target is at pre sputter position (look through window, purple glow at front position). 
       - Next set the flow to the original value and check that the pressure stabilises at 5E-3 mbar.
       - Set the DC potential to the desired value (typically 1 kV).
       - With the pressure and the plasma stable, time the pre sputtering of Au
       - When finished set HV setpoint to zero and **switch off HV** (red ''HV off'' button)
       - Repeat the ''pre sputter''steps above for the MoGe target, but leave the target ignited after pre sputtering!
  - **Sputtering**
       - With the MoGe target still ignited, move the target over your samples and time the deposition
       - Move back the MoGe target to pre sputter position and set HV setpoint to zero and **switch off HV** (red ''HV off'' button)
       - Select Au target with HV target selector knob (left of the chamber).
       - Set the Au target to the pre sputter position.
       - Set the DC voltage meter to 1 kV full scale (right display).
       - Turn the HV setpoint to zero (black knob on power supply).
       - Turn HV on (two on/off buttons).
       - Set 500 V RF (2nd display from the left, 5 kV scale).
       - Increase the flow setpoint temporarily to 75 sscm and check that the pressure rises.
       - Wait until the plasma ignites (right display shows non-zero value).
       - **Quickly** check that the ignited target is at pre sputter position (look through window, purple glow at front position). 
       - Next set the flow to the original value and check that the pressure stabilises at 5E-3 mbar.
       - Set the DC potential to the desired value (typically 1 kV).
       - With the pressure and the plasma stable, move the target over your samples and time the deposition
       - After 8 seconds blend in O<sub>2</sub> by setting the O<sub>2</sub> flip switch to the ''middle'' position again
       - Finish deposition and move target to pre sputter position
       - Set the O<sub>2</sub> flip switch to ''down'' position
       - Wait for the flow to be < 1% and switch off MFC electronics
       - Set HV setpoint to zero and **switch off HV** (red ''HV off'' button)
  - **End**
       - Close the MFC ('Close' button in software, read dialog, press OK).
       - Switch off HV power supply (left red turning knob).
       - Switch off cooling water.
       - Check that the mass flow controller valve is closed (indicated in the software by 'Vlv: C').
  - ** Vent with normal operating procedure**