====== Description ======
The barrel etcher is an O<sub>2</sub> resist etcher/stripper for post-development cleaning
of substrates or cleaning of SEM specimen. It is pumped by a 2-stage rotary pump with Fomblin oil.

====== Manual ======
  - Open the O<sub>2</sub> cylinder
  - Turn the valve to ''vent''
  - When the door pops open, close the vent valve
  - Remove the glass boat, //touch it only with gloves//
  - Put your substrate in the glass boat
  - Slide the glass boat back into the apparatus, in the middle of the electrodes or 'downstream'
  - Close the door and switch on the pump
  - Wait until the pressure drops below 1e-2 mbar
  - Turn the valve to ''etch''
  - Set the gas flow so that the chamber pressure is 1e-1 mbar
  - Switch on the mains of the RF power supply
  - Switch on RF power (100 W) and time the process (verify that reflected power is zero)
  - Switch off RF power
  - Switch off RF power supply
  - Switch off pump
  - Vent and remove the sample, turn the valve to ''off''
  - Leave the system at vacuum with the boat inside and the pump off

====== Etching rates ======
^ Material ^   Date   ^  Rate     ^
| PMMA     | 20050202 | 10 nm/min |


Be careful when etching resists on catalyst surfaces like Pd or Pt!